The opinion in support of the decision being entered today was not written
for publication and is not binding precedent of the Board.
Paper No. 13
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte KATSUYUKI MUSAKA
____________
Appeal No. 1999-2512
Application No. 08/888,499
____________
ON BRIEF
____________
Before WARREN, WALTZ, and POTEATE, Administrative Patent Judges.
WALTZ, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on an appeal from the examiner's final
rejection of claims 29 through 40 and 42 through 45, which are the
only claims remaining in this application. We have jurisdiction
pursuant to 35 U.S.C. § 134.
According to appellants, the invention is directed to a plasma
enhanced chemical vapor deposition process for depositing a
halogen-containing silicon dioxide onto a substrate from a mixture
of tetraethoxysilane (TEOS) and a halogen-containing gas, where the
plasma is formed by simultaneously turning on a plurality of power
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