Appeal No. 2001-2530 Page 6
Application No. 09/115,250
buttresses the claim construction viewpoint that has been
advanced in the briefs or otherwise supports appellant’s
position.
Moreover, representative claim 16 is not drawn to a
particular method that involves a sidewall spacer formation
etching step and a source/drain region formation step as
discussed by appellant in the brief but rather to a semiconductor
device.
On this record, appellant has not persuaded us of reversible
error in the examiner’s determination that representative claim
16 does not specify a transistor that differs structurally from
the transistor of Saida.1 Consequently, we shall affirm the
examiner’s stated rejection.
1 See 37 CFR § 1.192(a)
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