Ex Parte DATH et al - Page 4




          Appeal No. 2002-1010                                   Page 4               
          Application No. 09/206,210                                                  




               A.  The Rejections based on Obviousness-type Double                    
          Patenting                                                                   
               Appellants present no arguments against the examiner’s                 
          provisional rejections based on the judicially created doctrine             
          of obviousness-type double patenting (Brief, page 5).                       
          Accordingly, we presume that appellants acquiesce to these                  
          provisional rejections and thus summarily affirm all of the                 
          examiner’s provisional rejections based on the judicially created           
          doctrine of obviousness-type double patenting for the reasons               
          advanced by the examiner in the Answer.  See In re Wetterau, 356            
          F.2d 556, 557-58, 148 USPQ 499, 500-01 (CCPA 1966); cf. Ex parte            
          Karol, 8 USPQ2d 1771, 1773-74 (Bd. Pat. App. & Int. 1988).                  
               B.  The Rejection based on 35 U.S.C. § 103(a)                          
               The examiner finds that EP ‘060 discloses a process for the            
          conversion of olefins to propylene by contacting the feed with a            
          zeolite catalyst, where this catalyst has a Si/Al ratio of                  
          greater than 350 “which meets the instantly claimed values.”                
          Answer, page 4.4  The examiner finds that EP ‘060 does not                  
          disclose or teach the preparation of the zeolite catalyst as                

               4As noted by the examiner on pages 9 and 14 of the Answer,             
          the “greater than 350" mole ratio of Si/Al disclosed by EP ‘060             
          is equivalent to an atomic ratio for Si/Al of “greater than 175.”           





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