Appeal No. 2002-1914
Application 09/247,889
etching to ensure formation of a recess (63) having sloping side
walls with an angle of inclination of 70º or smaller so as to
form a thin film magnetic head wherein the magnetic fluxes are
gradually gathered toward the tip edge of the pole so that the
maximum magnetic flux density can be obtained at the tip end of
the pole so that recording can be performed with high recording
density. We see nothing in Sawada, the APA, or Ellenberger that
relates to appellant’s particular method of shaping a magnetic
head slider via a photoresist applied in the specific manner
required in claim 1 on appeal and subjected to baking and uniform
dry etching to shape the peripheral region of the slider ABS and
thus improve the magnetic head’s flying characteristics, as
appellant has done.
While page 2, lines 16-18, of appellant’s specification
allude to a method in the prior art in which the peripheral part
of a slider is chamfered by lapping the ABS or otherwise using
machining, we see nothing in this portion of the specification or
in the references to Ellenberger and Sawada which would have been
suggestive to one of ordinary skill in the art of appellant’s
method as set forth in claims 1 through 3 on appeal. In fact, as
appellant has pointed out in the brief, Ellenberger (at col. 6,
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