Appeal No. 2002-2244
Application 09/037,586
THE INVENTION
The appellants’ claimed invention is directed toward a
cleaning solution for semiconductor substrates. Claim 53 is
illustrative:
53. A cleaning solution for cleaning semiconductor
substrates comprising a solution formed by mixing:
approximately 100 ppm to approximately 2% by weight of
citric acid and approximately 100 ppm to approximately 0.1% by
weight of ammonium hydroxide (NH OH) in deionized water, wherein4
the cleaning solution has a pH in a range of approximately 2
to 4.
THE REFERENCES
Torii et al. (Torii) 5,972,862 Oct. 26, 1999
(filed Jul. 28, 1997)
Vines et al. (Vines) 6,048,789 Apr. 11, 2000
(filed Feb. 27, 1997)
THE REJECTIONS
The claims stand rejected under 35 U.S.C. § 103 as follows:
claims 53, 55, 57, 62 and 66 over Vines, and claims 59, 64, 65,
67, 70 and 71 over Vines in view of Torii.
OPINION
We reverse the aforementioned rejection. We need to address
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