Ex Parte IINO - Page 1




                     The opinion in support of the decision being entered             
                           today was not written for publication and                  
                             is not binding precedent of the Board                    
                                                       Paper No. 35                   
                                                                                     
                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                     __________                                       
                         BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                   
                                     __________                                       
                           Ex parte GUNMA-KEN EIICHI IINO                             
                                     ___________                                      
                                Appeal No. 2003-0136                                  
                             Application No. 09/229,086                               
                                     ___________                                      
                                      ON BRIEF                                        
                                     __________                                       
          Before WARREN, DELMENDO, and PAWLIKOWSKI, Administrative Patent             
          Judges.                                                                     
          PAWLIKOWSKI, Administrative Patent Judge.                                   

                                 DECISION ON APPEAL                                   

               This is a decision on appeal from the final rejection of               
          claims 1 through 4.                                                         
               Claim 1 is illustrative, and is set forth below:                       

               1.  A method of producing a silicon monocrystal which                  
          comprises preparing a silicon seed crystal having a sharp tip               
          end, and melting down a part of the silicon seed crystal from a             
          tip end to a position having a first thickness, followed by                 
          performing a necking operation to form a tapered necking part and           
          a neck portion, and subsequently pulling a monocrystal ingot                
          after increasing a diameter, wherein the first thickness is twice           
          as large as the diameter of the neck portion to be formed or                
          more; said necking operation is performed in such a way that the            
          tapered necking part is formed at an early stage by pulling the             
          crystal with gradually decreasing the diameter to a minimum                 
          diameter of 5 mm or more, and then a neck portion is formed,                





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