Appeal No. 2003-1911
Application No. 09/228,694
single meta-hydroxy moiety and is unsubstituted at other
available ring positions. This appealed subject matter is
adequately illustrated by independent claim 1 which reads as
follows:
1. A photoresist composition comprising a photoactive
component and a resin that comprises a polymer that comprises 1)
an acid labile group; 2) a meta-hydroxyphenyl group; and 3) a
para-hydroxyphenyl group, wherein the meta-hydroxyphenyl group
has a single meta-hydroxy moiety and is unsubstituted at other
available ring positions.
The references set forth below are relied upon by the
examiner in the Section 102 and Section 103 rejections before us:
Watanabe et al. (Watanabe) 5,844,057 Dec. 1, 1998
Watanabe et al. 6-49137 Feb. 22, 1994
(Japanese ‘137)
(Japanese Patent)
Urano et al. (Urano) 0 780 732 A2 June 25, 1997
(European Patent Application)
Claims 23, 27 and 29 stand rejected under the second
paragraph of 35 U.S.C. § 112 for failing to particularly point
out and distinctly claim the subject matter which the appellants
regard as their invention.
Claims 1-34 stand rejected under 35 U.S.C. § 103(a) as being
unpatentable over either Watanabe or Urano.
Claims 17 and 18 stand rejected under 35 U.S.C. § 102(b) as
being anticipated by Japanese ‘137.
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