The opinion in support of the decision being entered today was
not written for publication and is not binding precedent of the
Board.
Paper No. 11
UNITED STATES PATENT AND TRADEMARK OFFICE
__________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
__________
Ex parte YING-HO CHEN, WEN-CHIH CHIOU,
CHENG-CHUNG LIN, and SYUN-MING JANG
__________
Appeal No. 2004-0085
Application No. 09/876,447
__________
ON BRIEF
__________
Before GARRIS, PAK, and DELMENDO, Administrative Patent Judges.
GARRIS, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on an appeal from the final rejection of
claims 1 and 3-18 which are all of the claims in the application.
The subject matter on appeal relates to a method and
apparatus for in-situ cleaning of a pad and a wafer during
chemical mechanical polishing wherein an acid-containing solution
comprising water and an acid selected from the group consisting
of citric acid, HCOOH, CH3COOH, HNO3, H2SO4, and HF is dispensed
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