Appeal No. 2004-0138
Application No. 09/311, 800
THE INVENTION
The Appellants’ claimed invention relates to a method of cleaning the surface
of a microelectronic device. The claimed method comprises progressively immersing
the substrate in a cleaning fluid that includes ultradilute ammonia chemistry to clean
the microelectronic device. (Brief, p. 7). Claim 14 which is representative of the
invention is reproduced below:
14. A method of cleaning a surface of a microelectronic device at a
stage of manufacture, comprising the steps of:
providing a cleaning liquid comprising a concentration of aqueous
ammonia that is sufficiently dilute with respect to the aqueous ammonia
such that the cleaning liquid is substantially non-etching with respect to
the surface of the device;
positioning the device in a vessel;
introducing the cleaning liquid into the vessel under conditions effective
to help clean the surface of the device, wherein the step of introducing
the cleaning liquid to the vessel comprises progressively immersing the
device in the cleaning liquid; and
while the device is progressively immersed, transferring acoustic energy
to the cleaning liquid.
As evidence of unpatentability, the Examiner relies on the following
references:
Fujikawa et al. 5,520,744 May 28, 1996
(Fujikawa)
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