Appeal No. 2004-0532
Application No. 09/150,277
We reverse both rejections.
Chaiken describes a method for aligning a garment segment
pattern at a selected location in a marker with a geometric
design in a sheet of fabric. (Column 2, lines 31-36.)
Specifically, Chaiken teaches that “the method includes the
steps of receiving marker signals corresponding to the garment
segment patterns and a reference signal corresponding to a
reference location in the marker to be registered with the
fabric design and receiving the video sub-system signals,
including signals corresponding to the fabric sheet.” (Column
2, lines 42-48.) According to Chaiken (column 2, line 48 to
column 3, line 6), the method further includes:
generating signals indicative of the fabric design
from the fabric sheet signals; measuring a location of
the fabric design on the fabric sheet in accordance
with image processor signals; comparing the fabric
design location with the reference location and
generating signals to adjust the garment segment
pattern locations in the marker to remove any
difference in position between the measured fabric
design location and the marker reference location in
accordance with the steps of creating a first subarray
of pixel signal values configured from the marker
signals approximately centered on the reference
location; creating a second subarray of pixel signal
values from the fabric sheet image array approximately
centered on the fabric sheet image array center;
determining a first aggregate pixel value error from a
sum of pixel value errors found by a comparison
between corresponding first and second array values;
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