Appeal No. 2004-0630
Application No. 09/755,177
ozone dissolved in ultra pure water (e.g., see lines 22-36 in
column 4 and lines 36-54 in column 5). Following this immersion,
the substrate is rinsed in ultra pure water (e.g., see lines
52-64 in column 6).
As acknowledged by the appellant (e.g., see page 10 of the
Brief), one of patentee's embodiments for his previously
described method includes the step of introducing into the
immersion or processing tank/container water having dissolved
ozone therein (e.g., see lines 34-37 in column 7). The examiner
finds that this embodiment of the Kashiwase method anticipatorily
satisfies all of the requirements of appealed independent
claim 7. According to the appellant, the examiner's finding is
erroneous for two fundamental reasons.
First, the appellant argues that the method of Kashiwase
does not involve removing remover solvent from a substrate
pursuant to the independent claim on appeal. However, patentee's
method includes removing a photoresist film with a solution
comprising sulfuric acid wherein the so-treated substrate is then
rinsed so as to remove solution and film residue from the
substrate (e.g., again see the previously cited disclosures in
columns 1, 2 and 4-7). Thus, patentee's method includes the
removal of sulfuric acid solution from his substrate. This
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