Ex Parte Woo et al - Page 5


               Appeal No. 2004-0784                                                                                                   
               Application 09/826,078                                                                                                 

               steps as silicidation RTA and removal of unreacted metals, including nickel (pages 2437-39).                           
               Kunishima discloses a heating apparatus that provides a temperature gradient during the                                
               manufacture of semiconductor devices (e.g., cols. 2 and 11), as well as silicidation of a nickel                       
               layer on the wafer by RTA and the removal of unreacted metal (cols. 5-6 and 10).  Appellants                           
               admit in the “background art” section of their specification that the “first wafer effect” was                         
               known and, as was “fluctuating chamber hardware conditions results in process inconsistencies,”                        
               which were overcome in part by a “bakeout” process (page 2).                                                           
                       Based on the evidence of record in the combined teachings of Gupta, the admitted prior                         
               art, Wolf, Chen and Kunishima, we agree with appellants that there is no evidence with respect                         
               to the use of a heating element in a step or steps subsequent to the steps involved with the                           
               deposition of nickel on a single substrate.  Thus, on this record, there is no evidence in support of                  
               the examiner’s presumptions, and indeed, there is also no evidence in support for appellants’                          
               presumption, with respect to whether it was known that the heating element is on or off in any                         
               deposition chamber having any heating element, when a first treated substrate is removed from                          
               the chamber and a second substrate is introduced into the chamber, as required by appealed claim                       
               8.                                                                                                                     
                       The difference in the positions taken is, of course, that the examiner has the burden to                       
               establish a prima facie case of obviousness based on substantial evidence in the record in order to                    
               reject a claim under § 103(a).  See, e.g., In re Oetiker, 977 F.2d 1443, 1445, 24 USPQ2d 1443,                         
               1444 (Fed. Cir. 1992).  Mere reliance on “common sense” where such basis is not established by                         
               objective evidence and/or scientific reasoning, does not establish a prima facie case of                               
               obviousness.  See generally, In re Rouffet, supra (“hindsight” is inferred when the specific                           
               understanding or principal within the knowledge of one of ordinary skill in the art leading to the                     
               modification of the prior art in order to arrive at appellant’s claimed invention has not been                         
               explained); Dow Chem., 837 F.2d at 473, 5 USPQ2d at 1531 (“The consistent criterion for                                
               determination of obviousness is whether the prior art would have suggested to one of ordinary                          
               skill in the art that [the claimed process] should be carried out and would have a reasonable                          
               likelihood of success viewed in light of the prior art. [Citations omitted] Both the suggestion and                    
               the expectation of success must be founded in the prior art, not in the applicant’s disclosure.”).                     


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