Appeal No. 2004-1231 Application 09/481,224 fabrication yield of the machine. Appellants’ specification, page 9, line 16 through page 10, line 3. Appellants further state on page 10 of the Appellants’ specification: It is another object of the present invention to provide an apparatus for carrying out a pre-conditioning process on a conditioning disc in an off-line manner without sacrificing machine time. It is a further object of the present invention to provide an off-line pre-conditioning a conditioning disc that can be carried out without affecting the fabrication yield of the chemical mechanical polishing apparatus. Appellants describe the details of Appellants’ apparatus and method on pages 18-22 of Appellants’ specification as shown in Figs. 3, 3A-3C and 4. We note that the claimed apparatus shown in Figs. 3, 3A-3C and 4 is different and separate from the CMP apparatus shown in Figs. 1(A)-1(C). In addition, the original disclosure clearly describes that Appellants’ apparatus and method is for carrying out a preconditioning process on a conditioning disc in an off-line manner to save the production time of the CMP apparatus of the prior art. In other words, the term “off-line” here is meant to be “off” or “at the outside” of the production line that has the CMP apparatus. Therefore, we find that Appellants had possession of the 8Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 NextLast modified: November 3, 2007