Appeal No. 2004-2379
Application No. 09/710,769
material component at an anode material surface for
evaporation;
a cathode arrangement which defines said second
material component at a cathode material surface, said
cathode material surface being constituted by an
evaporation-active part supporting the plasma discharge
and an evaporation-inactive part not supporting the
plasma discharge;
a gas supply for supplying protective gas in front
of the cathode material surface to the
evaporation-active part of the cathode material
surface; and
a baffle arrangement exposing said
evaporation-active part at a baffle opening for the
plasma discharge and shading of the
evaporation-inactive part correspondingly from the
plasma discharge;
wherein said protective gas is so introduced into
an intermediate space between the baffle arrangement
and the cathode material surface that said supplied
protective gas escapes at least partially through the
baffle opening towards the plasma discharge from the
intermediate space between the cathode material surface
and the baffle arrangement.
In the rejection of the appealed claims, the examiner relies upon
the following references:
Akamatsu, et al. (Akamatsu) JP 11-100661 Apr. 13, 1999
Heinrich, et al. (Klaus) WO 00/46418 Aug. 10, 2000
(filed Feb. 05, 1999)
2
Page: Previous 1 2 3 4 5 6 Next
Last modified: November 3, 2007