The opinion in support of the decision being entered
today was not written for publication in a law journal
and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
Ex parte YUJI ONO
and
RYOICHI OHKURA
Appeal No. 2005-0536
Application No. 09/940,788
ON BRIEF
Before KIMLIN, WALTZ and DELMENDO, Administrative Patent Judges.
KIMLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal from the final rejection of claims 1-3,
all the claims remaining in the present application. Claim 1 is
illustrative:
1. A single wafer type substrate cleaning method of wet-
cleaned wafers which are not stored in a cassette, individually,
in a sealed cleaning housing, said method consisting of the
application of a spin drying treatment to the face of each wafer
by supporting and rotating each wafer at high speed in the sealed
cleaning housing while an inert gas for preventing oxidation is
supplied to the face of the wafer in a drying step, where the
-1-
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