Appeal No. 2005-0817
Application No. 10/167,683
The examiner relies upon the following references as
evidence of obviousness:
Nakamura et al. 5,405,725 Apr. 11, 1995
(Nakamura)
Chambers et al. 5,876,887 Mar. 2, 1999
(Chambers)
Dimitrakopoulos et al. 5,946,551 Aug. 31, 1999
(Dimitrakopoulos)
Wolk et al. 6,410,201 B2 Jun. 25, 2002
(Wolk) (filed Jul. 24, 2001)
Yang US 2002/0135039 A1 Sep. 26, 2002
(Patent Application Publication) (filed May 17, 2002)
Appellants' claimed invention is directed to a process for
forming a semiconductor layer by solution coating a dispersion
comprising a solvent and a binder resin in a continuous phase and
a disperse phase comprising an organic semiconductor material.
The formed semiconductor layer is part of a micro-electronic
device or a nano-electronic device.
The appealed claims stand rejected under 35 U.S.C. § 103(a)
as follows:
(a) claims 1-9 over Nakamura in view of Wolk,
(b) claim 10 over Nakamura in view of Wolk and Chambers,
(c) claim 11 over Nakamura in view of Wolk and Yang,
(d) claims 12-14 over Dimitrakopoulos in view of Nakamura
and Wolk.
Appellants submit at page 5 of the Brief that "[f]or each of
the rejections, the claims do not stand or fall together."
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