Ex Parte Wang et al - Page 2




             Appeal No. 2005-2150                                                                              
             Application No. 10/407,084                                                                        

                                               BACKGROUND                                                      
                   The invention relates to efficient fabrication of a microelectronic product within          
             multiple microelectronic product fabrication facilities.  Representative claim 1 is               
             reproduced below.                                                                                 
                   1.     A method for fabricating a microelectronic product comprising:                       
                          providing a plurality of microelectronic fabrication facilities comprising a         
                   plurality of tools employed for fabricating a single microelectronic product, the           
                   plurality of tools being divided into a series of comparable tool groups;                   
                          determining for the plurality of tools a corresponding plurality of tool             
                   utilization factors when fabricating the single microelectronic product within the          
                   plurality of microelectronic fabrication facilities;                                        
                          comparing a plurality of tool utilization factors for a specific comparable          
                   tool group to define an optimized tool utilization factor for the specific comparable       
                   tool group; and                                                                             
                          developing and implementing revised operating procedures for the                     
                   plurality of tools within the specific comparable tool group such that each tool            
                   within the specific comparable tool group operates at a tool utilization factor             
                   which approximates the optimized tool utilization factor for the specific                   
                   comparable tool group.                                                                      
                   The examiner relies on the following references:                                            
             Burdick et al. (Burdick)               5,889,674                 Mar. 30, 1999                    
             Kraft                                  5,528,510                 Jun. 18, 1996                    
             Nakamura et al. (Nakamura)      US 6,198,981 B1                  Mar.  6, 2001                    
             Martin                          US 6,259,959 B1                  Jul. 10, 2001                    
             Michael Quirk et al. (Quirk), Semiconductor Manufacturing Technology, Instructor’s                
             Manual, Prentice Hall College Div., ISBN 0130815209, pp. 1-68 (Dec. 2000).                        

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