The opinion in support of the decision being entered
today was not written for publication in a law journal
and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
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BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
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Ex parte LIHUA LI, WEN H. ZHU, TZU-FANG HUANG,
LI QUN XIA and ELLIE YIEH
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Appeal No. 2005-2442
Application No. 10/121,284
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ON BRIEF
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Before KIMLIN, OWENS and FRANKLIN, Administrative Patent Judges.
FRANKLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on appeal from the examiner’s final
rejection of claims 1 through 3 and 5 through 28.
Independent claim 1 is representative of the subject matter
on appeal and is set forth below:
1. A method for depositing a low dielectric constant film
having a dielectric constant of about 3.0 or less, comprising:
reacting a gas mixture comprising:
one or more cyclic organosilicon compounds;
one or more aliphatic organosilicon compounds;
one or more hydrocarbon compounds; and
one or more oxidizing gases; and
delivering the gas mixture to a substrate surface at
conditions sufficient to deposit the low dielectric constant
film on the substrate surface.
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Last modified: November 3, 2007