The opinion in support of the decision being entered today was not
written for publication and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte TINGHAO F. WANG
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Appeal No. 2006-0293
Application No. 10/071,809
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ON BRIEF
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Before OWENS, WALTZ and TIMM, Administrative Patent Judges.
WALTZ, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on an appeal from the primary examiner’s final rejection of
claims 1, 3 through 12, 14, 15, 21 through 23, 25 and 27, which are the only claims
pending in this application. We have jurisdiction pursuant to 35 U.S.C. § 134.
According to appellant, the invention is directed to a method of etching a metal
silicide layer while fabricating an integrated circuit using a chlorine/oxygen gas
environment at a pressure of approximately 2 to 40 mili-Torr and an oxygen
concentration of greater than or equal to 25% by volume (Brief, page 2).
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