The opinion in support of the decision being entered today was not
written for publication and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
__________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
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Ex parte MELISA BUIE, BRIGITTE STOEHR and GUENTHER RUHL
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Appeal No. 2006-1320
Application No. 10/024,958
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ON BRIEF
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Before KIMLIN, WALTZ and FRANKLIN, Administrative Patent Judges.
KIMLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal from the final rejection of claims 1-24.
Claim 1 is illustrative:
1. A method for processing a photolithographic
reticle, comprising:
positioning the reticle on a support member in a
processing chamber, wherein the reticle comprises a metal
photomask layer formed on a silicon based substrate and a
patterned resist material deposited on the metal photomask
layer;
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