The opinion in support of the decision being entered today was not
written for publication and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
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BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
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Ex parte TAKAEI SASAKI, NORIYUKI HARASHIMA,
SATOSHI AOYAMA, and SHOUICHI SAKAMOTO
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Appeal 2006-2988
Application 10/107,322
Technology Center 1700
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Decided: October 27, 2006
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Before KIMLIN, WARREN and WALTZ, Administrative Patent Judges.
KIMLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal from the final rejection of claims 19 and 20. Claim
19 is illustrative:
19. A dry-etching apparatus used in dry-etching a metal thin film,
wherein the apparatus is provided with a sequencer for establishing dry-
etching conditions and with a source of an etching gas comprising chlorine
gas, oxygen gas and one of either hydrogen gas or hydrogen chloride gas,
wherein said metal thin film to be dry-etched is a chromium-containing film,
wherein if an etching gas used consists of chlorine, oxygen and hydrogen
gases, the relative flow rates of these gases as expressed in terms of % by
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