Umit Tarakci - Page 3




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          issues.  Petitioner has worked for various companies dealing with           
          the applications of ultrasound, a highly specialized and                    
          technical subject matter.  In June of 1993, petitioner’s                    
          employment with Acuson, an ultrasound company located in                    
          California, ended after 5-1/2 years of service.  In August of               
          1993, petitioner commenced employment with Siemens Ultrasound,              
          located in Washington State.  Petitioner moved to Washington at             
          that time but returned to California on the weekends throughout             
          the remainder of 1993.  At the time of trial, petitioner remained           
          employed with Siemens Ultrasound.                                           
               In 1989, petitioner formed a sole proprietorship, “Cilena              
          Industries” (Cilena), under the laws of the State of California             
          for the purpose of manufacturing special semiconductor devices              
          and materials and conducting research in the semiconductor                  
          industry.  Petitioner originally intended to use Cilena as the              
          main business entity from which to conduct research and                     
          development.  However, petitioner abandoned this intention                  
          shortly after formation and, instead, engaged Cilena in other               
          business activities.  Cilena’s activities for the period 1990 to            
          1993 included:  (1) Providing consulting services; (2) leasing              
          specialized equipment for use in the semiconductor industry;4 and           


               4The equipment leased by Cilena included a fixed location              
          clean room facility, air-conditioning and exhaust and other                 
          ancillary systems, pattern generation equipment, photomask                  
          measurement and photomask defect detection systems, wet                     
                                                             (continued...)           





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