Appeal No. 95-0142
Application 07/817,961
In short, the applied references contain no teaching or
suggestion of removing contaminants (e.g., etching by-products)
from a wafer processing vessel via an inactive gas purge as in
Jucha or via an evacuating action as in Ukai during and after the
wafer unloading/removing step. It follows that we cannot sustain
the examiner's § 103 rejection of claims 14 through 19 and 21
through 28 as being unpatentable over Jucha in view of Ukai.
CONCLUSION
The decision of the examiner is reversed.
REVERSED
ANDREW H. METZ )
Administrative Patent Judge )
)
)
)
BRADLEY R. GARRIS ) BOARD OF PATENT
Administrative Patent Judge ) APPEALS AND
) INTERFERENCES
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THOMAS A. WALTZ )
Administrative Patent Judge )
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