Appeal No. 95-1750
Application No. 07/891,123
the final rejection. These are all of the claims in the
application.
The subject matter on appeal relates to a method for
developing a positive photoresist with a developer comprising
a quaternary ammonium hydroxide and a quaternary ammonium
halogenide. A photoresist of this method has an unexposed
portion dissolution rate with a 2.38 weight percent aqueous
solution of tetramethyl ammonium hydroxide of about 1 D/sec or
less. Further details of this appealed subject matter are set
forth in representative independent claim 1 which reads as
follows:
1. A method for developing a positive photoresist,
comprising providing a positive photoresist having an
unexposed portion dissolution rate with a 2.38 wt % aqueous
solution of tetramethyl ammonium hydroxide of about 1 D/sec or
less, image-wise exposing the positive photoresist to an
activating radiation to form a latent image, and removing the
exposed portions of the positive photoresist with a developer
comprising a quaternary ammonium hydroxide and a quaternary
ammonium halogenide of the formula
wherein R , R , R and R are selected from the group consisting1 2 3 4
of ethyl, methyl, hydroxymethyl, hydroxyethyl and hydrogen,
2
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