Appeal No. 95-1750
Application No. 07/891,123
and X is a halogen atom, the quaternary ammonium hydroxide
being included in an amount sufficient to dissolve an exposed
portion of the photoresist and the quaternary ammonium
halogenide being included in an amount sufficient to improve
the selectivity in dissolution between an exposed portion and
an unexposed portion of the photoresist by the quaternary
ammonium hydroxide.
The references relied upon by the examiner as evidence of
obviousness are:
Hilhorst et al. 3,607,271 Sep. 21, 1971
(Hilhorst)
Guild 4,423,138 Dec. 27, 1983
Tanaka et al. 4,873,177 Oct. 10, 1989
(Tanaka)
Kato et al. 4,914,006 Apr. 3, 1990
(Kato)
Claims 1 through 9 are rejected under 35 U.S.C. § 103 as
being unpatentable over Guild, Kato, Hilhorst and Tanaka.
We refer to the brief and reply brief and to the answer
for a complete exposition of the opposing viewpoints expressed
by the appellant and the examiner concerning this rejection.
OPINION
For the reasons set forth below, this rejection cannot be
sustained.
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