Appeal No. 95-2312
Application No. 07/897,870
The subject matter on appeal relates to a substantially
non- sparking magnetron sputtering target having regions of
sputtering and nonsputtering for a direct current sputtering
process which comprises insulation means for electrically
insulating a non- sputtering region from a sputtering gas
plasma created during the magnetron sputtering process, the
insulation means being of sufficient thickness to
substantially prevent catastrophic sparking during sputtering.
The appealed subject matter also relates to methods of making
and using such a target. This subject matter is adequately
illustrated by independent claim 1 which reads as follows:
1. A substantially nonsparking magnetron sputtering
target having regions of sputtering and nonsputtering for a
direct current sputtering process, comprising
an electrically conducting magnetron target material for
use in a magnetron sputtering process; and
insulation means for electrically insulating said non-
sputtering regions from a sputtering gas plasma created during
said magnetron sputtering process, said insulation means
selected from the group consisting of 1) a substantially
nonsputtering, electrically insulating material substituted
for said nonsputtering regions of said target and 2) a
substantially non-sputtering, electrically insulating material
covering said non-sputtering regions of said target which are
exposed to said gas plasma during sputtering, said insulation
means being of sufficient thickness to substantially prevent
catastrophic sparking during sputtering.
2
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