Appeal No. 95-3583
Application No. 08/185,294
slots, each of the slot [sic, slots] is inclined at an angle of
greater than zero degree with respect to a perpendicular line”
(Answer, page 3).
Suzuki discloses (Figure 1) apparatus for aligning a mask 12
and a wafer 13 during the manufacture of semiconductor circuit
elements. As seen in Figures 3 and 4, the mask 12 has a
plurality of circuit pattern areas A that are separated by narrow
strips S. In Figure 4, the mask 12 and the wafer 13 are shown in
an aligned position. In the narrow strip S, the plurality of
alignment marks C5 and C6 are located on the mask 12, and the
plurality of alignment marks C1 through C4 are located on the
wafer 13.
According to the examiner (Answer, pages 3 and 4):
It would have been obvious to one of ordinary
skill in the art at the time the invention was made to
use the teaching of Suzuki et al. and modify the system
of Wong et al. Such modification of using three slots
inclined with respect to each other is merely a
duplication of elements as opposed to two marks2
inclined with respect to each other (see fig. 6 of Wong
et al) in order to increase the lateral deviation
detection accuracy. One skilled in the art would have
been motivated to use the teaching of Suzuki et al. for
the purpose of precise alignment between an image and
reference point yielding to an accurate image recording
system.
2This statement gives the impression that the examiner is
relying on the sole teachings of Wong.
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