Appeal No. 96-3649 Application 08/344,509 metal constituents in a stoichiometric ratio desired for said film; vaporizing said precursor at a selected rate; hydrolyzing a portion of said precursor in the vapor state to form a hydrolyzed precursor; and reacting said hydrolyzed precursor on a substrate to form a film containing said metal constituents in said stoichiometric ratio. The references of record relied upon by the examiner are: Rothschild et al. (Rothschild) 4,888,203 Dec. 19, 1989 Purdy H1170 Apr. 6, 1993 Sladek et al. (Sladek), ?Low Temperature Metal Oxide Deposition by Alkoxide Hydrolysis?, Journal article announcement No. GRAI7301, published in Proceedings of the International Conference on Chemical Vapor Deposition (3rd), Salt Lake City, Utah, April 24-27, 1972, pages 215-231.2 Claims 1 through 6 and 23 through 29 stand rejected under 35 USC § 103 over Sladek in view of Purdy. Additionally, appealed claims 7 through 22 stand similarly rejected under the same section of the statute further in view of Rothschild. We affirm. The subject matter on appeal is directed to a method for the chemical vapor deposition of a heterometaloxide film (e.g., a 2Only an abstract of this publication is physically present in the record. 2Page: Previous 1 2 3 4 5 6 7 8 9 10 11 NextLast modified: November 3, 2007