Appeal No. 96-3649
Application 08/344,509
(films having undefined stoichiometry) were not further tested.
We also do not agree with appellants’ argument that the
references provide no suggestion as to how to produce a
stoichiometric double metal oxide film. Admittedly, Sladek only
describes the successful formation of single metal oxide films by
using a vapor phase hydrolysis chemical vapor deposition
technique. Importantly, however, Sladek indicates that the films
were all obtained at low temperatures, i.e., from 25 to 130EC.
Remembering that the problem of using a known double metal
alkoxide in a standard MOCVD process is the premature thermal
decomposition of the alkoxide into the respective individual
metal alkoxide components because of the high temperature
conditions required for pyrolysis (specification, page 7), one of
ordinary skill in the art would have been led to utilize such a
double metal alkoxide precursor in the low temperature vapor
phase hydrolysis chemical vapor deposition technique of Sladek
with a reasonable expectation of producing a stoichiometric
double metal oxide film. Based on the above analysis, it is our
view that a prima facie case of obviousness has been established
for the subject matter defined by independent claim 1 and those
claims dependent thereon.
Appellants have asked for separate consideration of several
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