Appeal No. 95-0537
Application No. 08/077,709
the superconductor formation temperature is the key
parameter in forming epitaxial a-axis films.
Compare col. 3, line[s] 10-25 of Geballe [sic,
Beasley] with page 6 of Appellant's specification.
Appellants argue (Brief, p. 31):
[T]he present invention is not merely growing a-axis
films epitaxially. Rather, the present invention is
to be able to control the orientation of the c-axes
in an a-axis film. . . . No where does Beasley
discuss, disclose or even mention controlling the
positioning of the c-axes in an a-axis film.
[Emphasis in original.]
We agree with appellants that Beasley is silent as to the
alignment of c-axes in an a-axis film.
To the extent that both Beasley and appellants use lower
temperatures to produce their respective a-axis films, Beasley
recognizes that annealing at lower temperatures for an
extended period of time after deposition of the film produces
a-axis films (col. 3, lines 10-15):
Films as deposited are basically various
amorphous-like oxides according to the X-ray
diffraction data. Subsequently they have usually
been annealed for 3 hours at 650EC. followed by 1
hour at 750EC. and 1 hour at 850EC. Our experience
shows that these annealing steps are enough for a-
axis oriented films.
In contrast, appellants disclose that maintaining the
substrate at a lower temperature during deposition produces an
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