Appeal No. 96-0633 Application 07/971,041 Independent claim 1 is reproduced below: 1. A semiconductor wafer structure comprising: a semiconductor substrate including a plurality of semiconductor device regions each of bearing a semiconductor device, and a plurality of dicing line regions separating said device regions; an insulation layer of a first material on a surface of said substrate, wherein said insulation layer has a plurality of apertures, each aperture surrounding a respective one of said device regions and electrically isolating each said device region from the others; and said apertures are each filled with a layer of a second material confined to be within said aperture. The following references are relied by the examiner: Esquivel et al. (Esquivel) 4,977,439 Dec. 11, 1990 Asano et al. (Asano) 5,128,744 July 7, 1992 (filed Sept. 12, 1989) Ishii et al. (Ishii) (Japanese Kokai) 2-2116522 Aug. 22, 1990 Claims 1 to 15 and 19 to 21 stand rejected under 35 U.S.C. Our understanding of this reference is based upon a translation2 provided by the Scientific and Technical Information Center of the Patent and Trademark Office. A copy of the translation is included with this opinion. 2Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 NextLast modified: November 3, 2007