Appeal No. 96-1567 Page 3
Application No. 08/112,914
(c) a second isolated oxide film formed on the bottom surface
of said each trench and connected to said first isolated oxide
film; and
(d) a third isolated oxide film formed on the major surface of
said semiconductor substrate and in contact [with] said first
isolated oxide film at the upper edge of said first sidewall of
said trench.
The prior art reference of record relied upon by the Examiner in rejecting the appealed
claims is:
Koyanagi US 5,021,842 Jun. 04, 1991
(Eff. Filing Date Apr. 16, 1984)
Claims 13, 15 and 16 stand rejected under 35 U.S.C. § 103 as being unpatentable
over Koyanagi.
Rather than reiterate the conflicting viewpoints advanced by the Examiner and the
appellant regarding the above-noted rejection, we make reference to the Examiner's
answer (Paper No. 65, mailed June 27, 1995 ) for the Examiner's complete reasoning in
support of the rejections, and to the appellant's brief (Paper No. 64, filed May 30, 1995) for
the appellant's arguments thereagainst.
OPINION
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