Appeal No. 1996-2734 Page 3
Application No. 08/133,680
15. An alkaline-containing photoresist stripping
composition comprising from about 50% to about 98%
by weight of a stripping solvent having a solubility
parameter of from about 8 to about 15, from about 1%
to about 50% by weight of a nucleophilic amine and a
reducing agent in an amount effective to inhibit or
reduce metal corrosion when said stripping
composition is employed to strip hardened or
cross-linked photoresist from a substrate containing
metal, said reducing agent being selected from the
group consisting of ascorbic acid, an unsaturated
ketone, uric acid, tetramisole, hydrazine and
derivatives thereof, oximes, hydroquinone, gallic
acid, 2,4,5-trihydroxybutyro-phenone,
3,5-di-tert-butyl-4-hydroxytoluene,
3-tert-butyl-4-hydroxyanisole, tocopherol,
6-hydroxy-2,5,7,8 -tetra- methylchroman-2-carboxylic
acid, a thiol selected from compounds of the formula
5 5
R SH where R is an organic radical selected from the
group consisting of heterocylic, dicarboxyalkyl, an
amino substituted carboxyalkyl radical or a radical
of the formula
0
5
R -0-C-R -6 7
6 7
where R and R are alkyl radicals; aldehydes and
their derivatives.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Schwartzkopf 5,308,745 May 03, 1994
(filing date - November 06, 1992)
Bhatt et al. (Bhatt) 5,310,428 May 10, 1994
(filing date - December 22, 1992)
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 Next
Last modified: November 3, 2007