Ex parte ESQUIVEL - Page 2




          Appeal No. 1997-1247                                                        
          Application 08/484,196                                                      


          cells.                                                                      


          The trenches are dielectric filled and are segmented.  The                  
          invention is further illustrated below by claim 25.                         
               25.  A programmable memory device having a memory array                
          formed in a semiconductor body including a plurality of memory              
          cells arranged into rows and columns comprising:                            
               a plurality of parallel and spaced apart slot trenches,                
          said slot trenches formed in sequences between said columns,                
          said slot trenches located at the crossings of diagonals with               
          respect to said rows and columns, each of said slot trenches                
          extending below said surface of said semiconductor body                     
          between said columns;                                                       
               a plurality of floating gates formed on a surfce (sic) of              
          said semiconductor body but separated from said surface of                  
          said semiconductor body by a gate dielectric, said floating                 
          gates positioned between said slot trenches;                                
               a plurality of control gates, each of said control gates               
          extending over at least one of said floating gates and a                    
          portion of said slot trenches, said control gates running                   
          perepndicular (sic) to said slot trenches and parallel of each              
          other, exactly two of said control gates running over each of               
          said slot trenches away from the periphery of the array of                  
          said rows and columns of memory cells; and                                  
               a plurality of source/drain regions formed in said                     
          semiconductor body between said control gates and between said              
          slot trenches.                                                              
               The references relied on by the Examiner are:                          
          Gill et al. (Gill)            5,045,489           Sep.  3, 1991             


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