Appeal No. 1997-3415
Application No. 08/037,849
ordinary skill in the art would have made this modification to
Nozue's method.
Furthermore, we fail to find that Nozue provides any
reasoning to use an aromatic group attached to each silicon atom
of
the polymer in a method of forming a dielectric layer in a
semiconductor wafer.
We have not sustained the rejection of claims 16-26 under
35 U.S.C. § 103. Accordingly, Examiner's decision is reversed.
REVERSED
JAMES D. THOMAS )
Administrative Patent Judge )
)
)
)
) BOARD OF PATENT
ERROL A. KRASS ) APPEALS
Administrative Patent Judge ) AND
) INTERFERENCES
)
)
)
MICHAEL R. FLEMING )
Administrative Patent Judge )
8
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 Next
Last modified: November 3, 2007