Appeal No. 1997-4423
Application No. 08/355,009
one of ordinary skill in the art would have found it obvious
to add shutters to the apertures of the admitted prior art
device, suggestion being found in the explicit teaching of
Doehler that this allows the microwave energy to "be
distributed in a desired, controllable manner" (column 8, line
32).
Still lacking from the apparatus of the admitted prior
art as modified by the teachings of Doehler is the plurality
of operating members for controlling the position of the
shutters from outside of the processing chamber. Bloom
discloses in column 2 a sputtering apparatus having a vacuum-
tight chamber 10 which is provided with a shutter mechanism
comprised of overlapping plates 38 and 40. By means of
rotatable shafts 42 and 44, the position of the shutters can
be controlled to shield or expose the substrate. The control
shafts "are journaled through the wall 46 of the sputtering
chamber" (lines 45-47) to communicate with a shutter control
apparatus 48 that is located outside of the processing
chamber. In Kenichi, the position of a microwave deflection
correcting plate located within a processing apparatus is
controlled from outside by a mechanism that passes through the
8
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