Ex parte SCHMIT et al. - Page 34




          Appeal No. 1998-0425                                      Page 34           
          Application No. 08/272,527                                                  


          11.       The apparatus according to claim 9 including means                
          for controlling the concentration of HCl in the mixture of                  
          treating gas and HCl at a mole fraction within the range from               
          about 4x10  to about 3.1x10 .-5              -2                                               
          12.       Liquid treatment apparatus comprising:                            
               a gas distribution network in a tank;                                  
               means for introducing treating gas into said network;                  
               a source of cleaning gas;                                              
               means including valve means for intermittently                         
          introducing into said network said cleaning gas alone or in                 
          admixture with the treating gas;                                            
               a plurality of flow regulating means distributed about a               
          submerged portion of the network for receiving the                          
          aforementioned gases and for discharging them into a plurality              
          of plenums downstream of the flow regulating means, said flow               
          regulating means tending to promote gas flow into said plenums              
          at similar rates; and                                                       
               a plurality of at least ten multi-pore area release                    
          diffusion elements sealingly engaged and in communication with              
          said plenums for receiving said gases, said diffusion elements              
          being members which comprise a multiplicity of closely spaced               
          fine pores defining paths for discharge of said gases and                   
          which exhibit an increase in dynamic wet pressure and/or                    
          bubble release pressure as a result of deposition of foulants,              
          each of said diffusion elements being in communication with                 
          its own individual flow regulating means through its own                    
          individual plenum downstream of the flow regulating means for               
          tending to promote gas flow through said diffusion elements at              
          similar rates;                                                              
               measuring means for monitoring the operation of said                   
          liquid treatment apparatus by measuring changes in operating                
          parameters of the apparatus that indicate dynamic wet pressure              
          changes across the diffusion elements with sufficient                       
          precision for initiating the flow of cleaning gas with                      
          sufficient frequency for maintaining the dynamic wet pressure               
          across the diffusion elements in a range not to exceed about                
          25 inches of water gauge above said base condition.                         









Page:  Previous  27  28  29  30  31  32  33  34  35  36  37  38  39  40  41  Next 

Last modified: November 3, 2007