Appeal No. 1998-0425 Page 33
Application No. 08/272,527
4. The apparatus according to claim 2 wherein said means for
adjusting the flow of gas includes means for adjusting the
flow of treating gas before cleaning is initiated.
5. The apparatus according to claims 3 or 4, wherein each of
said groups constitutes diffusion elements within an
individual tank in a multi-tank plant.
6. The apparatus according to claim 1 wherein said source of
cleaning gas comprises a source of HCl and the apparatus
includes means for introducing HCl as the cleaning gas into
said network.
7. The apparatus according to claims 1, 2, 3 or 4, wherein
said means for introducing treating gas and cleaning gas into
said network includes means for admixing HCl with said
treating gas, and means for controlling the concentration of
HCl in the resulting mixture at a level sufficient to clean
said diffusion elements.
8. The apparatus according to claims 1, 2, 3 or 4, wherein
said means for introducing treating gas and cleaning gas into
said network includes means for admixing HCl with said
treating gas, and means for controlling the concentration of
HCl in the resulting mixture at a mole fraction within the
range from about 4x10 to about 3.1x10 .-5 -2
9. The apparatus according to claims 1, 2, 3 or 4, wherein
said means for introducing treating gas and cleaning gas into
said network includes means for admixing HCl with said
treating gas and means for discharging the resulting mixture
of gases into the plenums at a rate of about 6 to about 8 SCFM
per square foot of active discharge area of said diffusion
elements.
10. The apparatus according to claim 9 including means
for controlling the concentration of HCl in the mixture of
treating gas and HCl at a level sufficient to clean said
diffusion elements.
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