Ex parte OHSAKI - Page 6




          Appeal No. 1998-0694                                                        
          Application No. 08/637,009                                                  


          35 U.S.C. § 112.  The admitted prior art in appellant’s                     
          specification clearly identifies the problem that the titanium              
          silicide films of the prior art agglomerate at certain                      
          annealing temperatures.  The original specification also                    
          clearly identifies that the solution to this problem is to                  
          form a thermal oxide film over the titanium silicide film                   
          which prevents such agglomeration at these annealing                        
          temperatures.  Since the entire premise of the disclosed                    
          invention is that the titanium silicide agglomerates without                
          the thermal oxide, but does not agglomerate with the thermal                
          oxide, it is quite apparent that appellant was describing a                 
          device in which agglomeration would occur in the absence of                 
          the thermal oxide.  This description is clearly commensurate                
          in scope with the language of the claims which has been                     
          objected to by the examiner in formulating the rejection.                   
          Therefore, we conclude that the original disclosure in this                 
          application provides proper support for the invention now                   
          being claimed.                                                              
          We now consider the rejection of claims 22, 24-28 and                       
          30-36 under 35 U.S.C. § 103.  In rejecting claims under 35                  
          U.S.C.                                                                      
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