The opinion in support of the decision being entered
today was not written for publication and is
not binding precedent of the Board
Paper No. 29
UNITED STATES PATENT AND TRADEMARK OFFICE
_______________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
_______________
Ex parte TOSHIAKI TAKAKU
______________
Appeal No. 2000-0156
Application 08/531,023
_______________
ON BRIEF
_______________
Before THOMAS, LALL and GROSS, Administrative Patent Judges.
THOMAS, Administrative Patent Judge.
DECISION ON APPEAL
Appellant has appealed to the Board from the examiner’s
final rejection of claims 6, 8, 9, 11, 12 and 14.
Independent claim 6 is reproduced below:
6. In a thermal chemical vapor deposition apparatus having
a quartz glass reaction tube that is used for heat-treating
semiconductor wafers, the improvement which comprises:
making the quartz glass reaction tube from transparent
quartz glass; and
providing the quartz glass reaction tube with at least one
sand-blasted internal wall surface portion, which at least one
said-blasted internal wall surface portion has a center-line mean
roughness in the range of 1 Fm to 20 Fm and is heated by a heater
during heat-treatment.
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