Appeal No. 1997-3335 Page 3
Application No. 08/315,454
(c) annealing said films at a temperature above 450 C in an oxygen-containing atmosphere,
thereby forming said dielectric laminate comprising a plurality of grains with a perovskite crystal
structure, each grain comprising titanium, oxygen, and at least one of barium and strontium, said
dielectric laminate further comprising boundary regions between said grains, essentially all of said boron
existing in said boundary regions as B O ; and
2 3
(d) forming a second electrode over said dielectric laminate.
The prior art references of record relied upon by the Examiner in rejecting the appealed claims
are:
Soong 4,379,854 Apr. 12, 1983
Bhargava et al. (Bhargava) 4,959,089 Sep. 25, 1990
Lipeles et al. (Lipeles) 4,963,390 Oct. 16, 1990
Takagi et al. (Takagi) 4,988,650 Jan. 29, 1991
Abe et al. (Abe) 5,292,694 Mar. 8, 1994
Kulwicki et al. (Kulwicki) 5,368,834 Nov. 29, 1994
(filed Aug. 13, 1993)
Kim et al. (Kim) 5,378,667 Jan. 3, 1995
(filed Dec. 10, 1993)
Claims 1-5 and 7 stand rejected under 35 U.S.C. § 103 as being unpatentable over Lipeles in
combination with any one of Abe, Takagi, Bhargava or Soong. Claim 6 stands rejected under 35
U.S.C. § 103 as being unpatentable over the above mentioned prior art references and further in view
of Kulwicki. Claims 8-10 stand rejected under 35 U.S.C. § 103 as being unpatentable over all of the
above prior art references and still further in view of Kim. We reverse for the reasons that follow.
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