Appeal No. 1997-3767 Page 2
Application No. 08/443,556
BACKGROUND
Appellants’ invention relates to a method of manufacturing a magnetic recording medium.
Claims 11 and 14 are illustrative:
11. A method of manufacturing a magnetic recording medium in which a magnetic thin film is
formed on a substrate directly or via an undercoating film, an abrasion-resistant
protective film is formed on said magnetic thin film, and a lubricating organic film is formed on said
protective film comprising:
the first step of depositing said protective film consisting essentially of carbon and silicon by
sputtering a target composed of a mixture of carbon and silicon as a cathode in a vacuum tank in which
a reduced-pressure atmosphere can be formed, said silicon in said protective film ranges from 5 to 25
atomic percent with respect to said carbon in said protective film; and
the second step of heating and oxidizing a part or all of said silicon present on at least a surface
of said protective film formed in said first step in an atmosphere containing oxygen before formation of
said organic film, said silicon at least in an interface in contact with said organic film being oxidized at
least partially to silicon oxide, and said lubricating organic film being bonded to said silicon oxide in said
interface thereby said silicon oxide substantially improving adhesion of said lubricating organic film to
said protective film.
14. A method of manufacturing a magnetic recording medium in which a magnetic thin film is
formed on a substrate directly or via an undercoating film, an abrasion-resistant protective film is
formed on said magnetic thin film, and a lubricating organic film is formed on said protective film,
comprising:
the first step of depositing said protective film consisting essentially of carbon and silicon by
sputtering a target composed of a mixture of carbon and silicon as a cathode in a vacuum tank in which
a reduced-pressure atmosphere can be formed, said silicon in said protective film ranges from 5 to 25
atomic percent with respect to said carbon in said protective film; and
the second step of oxidizing, using an oxygen ion plasma, a part or all of said silicon present on
at least a surface of said protective film formed in said first step before formation of said organic film,
said silicon at least in an interface in contact with said organic film being oxidized at least partially to
silicon oxide, and said lubricating organic film being bonded to said silicon oxide in said interface
thereby said silicon oxide substantially improving adhesion of said lubricating organic film to said
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