Appeal No. 1998-1411 Page 2
Application No. 08/562,316
BACKGROUND
Appellants’ invention relates to a negative photoresist composition and a process for producing
a negative resist image using the composition. Claim 1 is illustrative of the composition on appeal:
1. A negative resist material comprising:
a) a binder comprising a polymer selected from the group consisting of acrylic
polymers and methacrylic polymers;
b) a monomer having from two to four ethylenic double bonds;
c) a photoinitiator; and
d) a solvent comprising a compound selected from the group consisting of 2-
methoxybutanol, propylene glycol butyl ether, ethylene glycol ethyl ether acetate,
propylene glycol propyl ether, propylene glycol tertiary butyl ether, ethylene
glycol ethyl ether, dipropylene glycol methyl ether, and propylene glycol methyl
ether acetate;
wherein the photoinitiator is present in an amount of greater than 10% by weight of the material without
the solvent and wherein the binder has a Tg of 110/ C or greater.
The prior art references of record relied upon by the Examiner in rejecting the appealed claims
are:
Hill 4,339,527 July 13, 1982
Hofmann et al. (Hofmann) 4,935,330 June 19, 1990
Dammel et al. (Dammel) 5,234,791 Aug. 10, 1993
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