Appeal No. 1998-3074
Application 08/804,850
C. a first patterned layer of metal formed over and insulated from the patterned
layer of polysilicon;
D. a top layer of patterned metal formed over the first patterned layer of metal, at
least one fuse portion of the top layer of patterned metal forming a fuse link; and
E. an oxide layer formed over at least the fuse portion of the top layer of patterned
metal.
The following references are relied on by the examiner:
Simmons et al. (Simmons) 4,714,949 Dec. 22, 1987
Mizushima 5,404,045 Apr. 4, 1995
(filed Feb. 22, 1994)
Claims 1 through 7 and 19 through 26 stand rejected under 35 U.S.C. § 103. As
evidence of obviousness, the examiner relies upon Simmons in view of Mizushima.
Rather than repeat the positions of the appellants and the examiner, reference is
made to the briefs and the answer for the respective details thereof.
OPINION
We reverse the art rejection under 35 U.S.C. § 103 of claims 1 through 7. Because
we introduce a rejection of claims 19 through 26 under the second paragraph of 35 U.S.C.
§ 112, we reverse the art rejection under 35 U.S.C. § 103 of these claims in a pro forma
sense.
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