Appeal No. 2000-0049
Application 08/826,209
have been obvious to one of ordinary skill in the art over
Okamura in view of the appellant’s admitted prior art
regarding biased nucleation chemical vapor deposition
(specification, page 13, lines 1-7).4
DECISION
The rejections under 35 U.S.C. § 103 of claims 1, 2, 5-9,
12, 18 and 19 over Okamura in view of Taniguchi, and claims 3
and 10 over Okamura in view of Taniguchi and the admitted
prior art, are reversed. The application is remanded to the
examiner.
REVERSED and REMANDED
TERRY J. OWENS )
Administrative Patent Judge )
)
)
The examiner also should consider whether the appellant’s claim 7 provides adequate4
antecedent basis for “said step of depositing said first layer” in claim 19.
9
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