Appeal No. 2000-0281
Application 08/907,494
1. A method for preparing a layered structure comprising a lower thin film
composed of an oxide superconductor and an upper thin film composed of a material
different from the oxide superconductor on a substrate wherein the lower thin film is
deposited by a molecular beam deposition process and the upper thin film is deposited
by a process other than a molecular beam deposition process, having a deposition rate
faster than that of the molecular beam deposition process.
THE REFERENCES
In rejecting the appealed claims under 35 U.S.C. §103(a), the Examiner relies on
the following references:
Nakamura et al. (Nakamura) 5,423,914 Jun. 13, 1995
Cho et al. (Cho) JP 63-274190 Nov. 11, 1988
(Japanese Unexamined Patent)1
Kingston et al., Appl. Phys. Lett. 56(2), January 8, 1990 (Kingston)
THE REJECTIONS
Claims 1-2, 6-7, and 12-14 stand rejected under 35 U.S.C. § 103(a) as being
unpatentable over Nakamura in view of Kingston.
Claims 3-5 and 15 stand rejected under 35 U.S.C. § 103(a) as being
unpatentable over Nakamura in view of Kingston, further in view of Cho.
1 All citations to this reference are to the English translation of record.
2
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