Appeal No. 2000-0314 Application No. 08/944,192 OPINION We have carefully considered the entire record before us, and we will reverse the 35 U.S.C. § 102(b) rejection of claim 15, and the 35 U.S.C. § 103(a) rejection of claims 1 through 14 and 16. Turning first to the anticipation rejection of claim 15, the examiner indicates (answer, page 4) that Hoshino discloses all of the limitations of product claim 15 except for the photolithographic process and the laser process for making the vias in the photoimaged dielectric layer and the non-2 photoimaged dielectric layer, respectively. According to the examiner (answer, page 4), the “presence of process limitations in product claims, which product does not otherwise patentably distinguish over prior art, cannot impart patentability to that product.” When the claimed invention is to a product, it is the patentability of that product that is determined, not the method by which it is made. In re Thorpe, 777 F.2d 695, 697, 227 USPQ 964, 966 (Fed. Cir. 1985). If the 2Hoshino indicates (translation, pages 6, 14, 17, 18 and 21) that the vias in the two dielectric layers are formed by chemical means. 5Page: Previous 1 2 3 4 5 6 7 8 9 NextLast modified: November 3, 2007