Appeal No. 2000-1164 Page 3
Application No. 08/899,176
Yamashita et al. (Yamashita) 4,569,695 Feb. 11, 1986
Eitoku, “Post-CMP Cleaning Technology,” Semicon Korea 95 (January
19, 1995), pages 29-36.
Kern (editor), HANDBOOK OF SEMICONDUCTOR WAFER CLEANING
TECHNOLOGY, Noyes Publications (1993), pages 28-67 and 78.
Claims 1, 2, 6, 8, 9 and 15 stand rejected under 35 U.S.C.
§ 102 as anticipated by Eitoku. Claims 1-6, 8, 9 and 15 stand
rejected under 35 U.S.C. § 102 as anticipated by Yamashita.
Claims 7, 13, 14, 19 and 20 stand rejected under 35 U.S.C. § 103
as being unpatentable over Eitoku in view of the admitted prior
art in the specification (Background of the Invention, especially
page 2, lines 10-13). Claims 10-12 and 16-18 stand rejected
under 35 U.S.C. § 103 as unpatentable over Kern taken in
combination with Eitoku.
We refer to the brief and to the answer for a complete
exposition of the opposing viewpoints expressed by appellants and
the examiner concerning the issues before us.
OPINION
Having carefully considered each of appellants* arguments
set forth in the brief, appellants have not persuaded us of
reversible error on the part of the examiner with respect to the
rejections involving Eitoku as part or all of the prior art
evidence relied upon by the examiner. The examiner’s § 102
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Next
Last modified: November 3, 2007