The opinion in support of the decision being entered
today was not written for publication in a law journal
and is not binding precedent of the Board.
Paper No. 13
UNITED STATES PATENT AND TRADEMARK OFFICE
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
Ex parte DAVID K. FOOTE and MINH V. NGO
Appeal No. 2000-1955
Application No. 08/857,055
ON BRIEF
Before KIMLIN, KRATZ and LIEBERMAN, Administrative Patent Judges.
KIMLIN, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal from the final rejection of claims 1-10
and 16-28. Claims 11-15, the other claims remaining in the
present application, stand withdrawn from consideration pursuant
to an election requirement. Claim 1 is illustrative:
1. A process for forming an anti-reflective coating on a
semiconductor structure, comprising the steps of:
(a) forming an anti-reflective layer of a material
selected from the group consisting of silicon oxime, silicon
oxynitride, and silicon nitride on the structure; and
(b) growing a barrier layer on the anti-reflective layer
using a nitrous oxide plasma discharge to convert a surface
portion of the anti-reflective layer into silicon dioxide.
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