Ex Parte Foote et al - Page 2



          Appeal No. 2000-1955                                                        
          Application No. 08/857,055                                                  

               The examiner relies upon the following references as                   
          evidence of obviousness:                                                    
          Nagahisa et al. (Nagahisa)      5,888,855           Mar. 30, 1999           
          Stanley Wolf Ph.D. and Richard N. Tauber Ph.D. (Wolf), 1 Silicon            
          Processing for the VLSI Era 427-28, 441 (Lattice Press, Sunset              
          Beach, CA 1986)                                                             
          Admitted Prior Art, page 1                                                  
               Appealed claims 1-10 and 16-28 stand rejected under                    
          35 U.S.C. § 103 as being unpatentable over Nagahisa in view of              
          Wolf and the Admitted Prior Art.  The examiner's rejection under            
          the judicially-created doctrine of obviousness-type double                  
          patenting over U.S. Patent No. 5,710,067 has been withdrawn (see            
          page 7 of Answer, first paragraph).                                         
               Upon careful consideration of the opposing arguments                   
          presented on appeal, we find that the examiner has not                      
          established a prima facie case of obviousness for the claimed               
          invention.  Accordingly, we will not sustain the examiner's                 
          rejection.                                                                  
               Since Nagahisa discloses a process of forming a silicon                
          nitride film on a semiconductor structure and treating the                  
          silicon nitride film with a nitrous oxide plasma to oxidize a               
          surface portion of the silicon nitride film, the examiner reasons           
          that the referenced silicon nitride film and oxidized surface               

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